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					CHAPTER 8 - PIEZOELECTRIC CRYSTALS
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					The industrial production of crystals, for AT cutting as well as for other cuttings, is done mostly by the following procedure: 
					 
						- Gross cutting of the crystal for a given cutting angle,
 
						- Cutting of a chop of crystal with a special angle,
 
						- Measurement of the angle, of the crystal chop, in degrees, minutes, seconds, with x-rays for the success of the required frequency,
 
						- Exterior process (continual rubbing) in order to avoid other vibration modes except for the required,
 
						- Placing of mask on the crystal chop (0.1μm) for achieving the required frequency (lapping),
 
						- Specification, on the chop, of the required vibration mode (beveling), only for using the crystal in low frequencies,
 
						- Chemical removal of the mask created on the chop in steps 5 and 6 (etching),
 
						- Manufacture of electrodes on the chop (from Al, Ag, Au etc.) with sublimation by a special device,
 
						- Propping of the crystal chop on a fixed basis, with conductive acetic glue or conductive cement,
 
						- Placing of more electrode material, on the basic electrode, for micrometric adjustment of the frequency of the crystal in the area of resonance frequencies,
 
						- Mechanical stamping of the crystal with its basis, in very low temperature and N and R environment for avoiding future oxidation,
 
						- Final testing,
 
						- Imprinting of the elements on the component jacket.
 
					 
					 
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