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CHAPTER 8 - PIEZOELECTRIC CRYSTALS
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The industrial production of crystals, for AT cutting as well as for other cuttings, is done mostly by the following procedure:
- Gross cutting of the crystal for a given cutting angle,
- Cutting of a chop of crystal with a special angle,
- Measurement of the angle, of the crystal chop, in degrees, minutes, seconds, with x-rays for the success of the required frequency,
- Exterior process (continual rubbing) in order to avoid other vibration modes except for the required,
- Placing of mask on the crystal chop (0.1μm) for achieving the required frequency (lapping),
- Specification, on the chop, of the required vibration mode (beveling), only for using the crystal in low frequencies,
- Chemical removal of the mask created on the chop in steps 5 and 6 (etching),
- Manufacture of electrodes on the chop (from Al, Ag, Au etc.) with sublimation by a special device,
- Propping of the crystal chop on a fixed basis, with conductive acetic glue or conductive cement,
- Placing of more electrode material, on the basic electrode, for micrometric adjustment of the frequency of the crystal in the area of resonance frequencies,
- Mechanical stamping of the crystal with its basis, in very low temperature and N and R environment for avoiding future oxidation,
- Final testing,
- Imprinting of the elements on the component jacket.
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